Rapid Scanning
AFM for Education
May 2008 Image of the Month...
Home
About Us
Products
Our Customers
News & Events
Applications
Gallery
Technology
AFM History
AFM tutorials
AFM Artifacts
AFM Modes
Dual Scanner
Modifications/Lithography
Nanotechnology
SPM Feedback
Standards/References
SPM Scanner Certification
Image Contest
Developer's Corner
Contact
Careers
Newsletter
AFM University Nanoparticles
AFM University Nanoparticles
Probe Store
Probe Store
home inquire newsletter search site map
 
Printable version

Surface Modification

 

AFM Lithography Instrumentation

Any atomic force microscope can be used for creating nanometer-sized patterns on a surface. However, the quality and complexity of the patterns depends on specific scanning probe hardware and software. The method of patterning is determined by the types of probes, substrates, and the specific software performance capabilities used to drive the scanning probe tool.
Hardware: The most critical hardware feature that is required is an X-Y calibration system. Because the piezoelectric ceramics used in AFM have unwanted characteristics such as creep and hysteresis, calibration sensors are necessary to guide the motion of the probe. Without the calibration sensors, the probe moves in an unpredictable motion, and it is hard to write complex patterns. As an example, in figure 5 the AFM did not have calibration sensors, and the lines at the upper right of the pattern did not connect as intended. Conversely, Figure 6 is an illustration of a complex pattern drawn with the DPN™ process. Because the instrumentation had X-Y calibration sensors, a higher quality pattern was possible.
Figure 6: Lateral Force Microscope (LFM) images of patterns created using DPN™. With X-Y calibration sensors the lines at the edges of the boxes intersect as expected. Image written with a NanoInk DPN Writer™ using PNI scanner technology. Line widths vary from 60 nm - 100 nm.
Software: Software is used for defining the pattern that will be drawn with an AFM and then for drawing the pattern on a materials surface. Figure 7 shows a control window that may be used for creating patterns with an AFM. The pattern may be drawn on a section of the screen as a combination of dots and lines or it may be imported from a bit-map file. The software allows writing of the patterns by applying a specific force or a specified voltage. Also, the rate of scanning can be specified.
Figure 7: A typical control window for modifying surfaces with an AFM. Each of the buttons has a drop down menu that facilitates selection of parameters.
Advanced DPN™ patterning involves the overlay of complex pattern layers with the precise deposition of molecules, and this process requires more complex instrumentation. NanoInk has developed a dedicated DPN™ Writer tool called NSCRIPTOR™. Built upon advanced PNI scanner technology, NSCRIPTOR™ offers a sophisticated, user-friendly DPN™ experience with integrated environmental control.
 
 
 
© Copyright 2002 -2007 Pacific Nanotechnology, Inc. All Rights Reserved.
No part of this site can be copied without prior agreement with Pacific Nanotechnology.