Z Calibration
A calibration standards/references are needed to calibrate SPM in the vertical axis. For calibrations greater than 10 nm step height standard or references are typically fabricated by etching patterns in a quartz substrate. Another source for references is etched silicon, or silicon dioxide coated with a uniform layer of metal. When calibrating the instrument for Z height measurements below 10 nm, nano-spheres, atomic terraces of silicon or HOPG may be used as a reference specimen.
| Company |
Standard/Reference |
| VLSI Standards |
StandardsZ = 18nm, 44nm, 100nm, 180nm
Pitch = 1.8µm, 3µm, 5µm, 10µm, 20µmReferences:Z = 18nm, 44nm, 100nm, 180nm
Pitch = 3µm, 10µm |
| MicroMasch |
Z = 20÷25nm, 90÷104nm, 496÷503nm, 1000nm, 15000nm
Pitch = 3µm, 10µm
HOPG all grades |
| SPI Supplies |
Pitch = 300nm, 700nm
Z ~100nm |
| Ted Pella |
Pitch = 0.463µm
Z ~31nm |
| PacificNanotechnology |
Pitch = 20µm, 10µm, 5µm, 3µm
Z ~75nm |
| Electron Microscopy Science |
Pitch = 150nm, 300nm, 700nm
Z ~100nm |
| NTT-AT |
AtomicStep = 3.1nm |
 Figure 1: This AFM image is of a single etched pattern of an AFM standard. The histogram at the right show the height of the feature is 16.62 nm.
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